Influence of silicon carbide interlayer evolution on diamond heteroepitaxy during bias enhanced nucleation on silicon substrates
✍ Scribed by Sarrieu, Cyril; Bauer-Grosse, Elizabeth; Barrat, Silvère
- Book ID
- 118130533
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 648 KB
- Volume
- 20
- Category
- Article
- ISSN
- 0925-9635
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📜 SIMILAR VOLUMES
Pulsed bias-enhanced nucleation of highly oriented diamond on (100) silicon is reported. A square waveform substrate bias was implemented in this investigation employing a pulse ON bias voltage of --250 V and a pulse OFF bias voltage of 0 V. An evaluation of the pulse ON fractions of 0.17 and 0.50 r
## Abstract Diamond synthesis by microwave plasma assisted chemical vapour deposition (MPCVD) with a bias enhanced nucleation (BEN) step constitutes the most efficient method to obtain heteroepitaxy and is also useful to reach high nucleation densities. In this study, sequential reflection high‐ene