Influence of RF power on the properties of sputtered ZnO:Al thin films

✍ Scribed by Antony, Aldrin ;Carreras, Paz ;Keitzl, Thomas ;Roldán, Rubén ;Nos, Oriol ;Frigeri, Paolo ;Miguel Asensi, José ;Bertomeu, Joan

• Publisher: John Wiley and Sons
• Year: 2010
• Tongue: English
• Weight: 357 KB
• Volume: 207
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200983765

✦ Synopsis

Abstract

Transparent conducting, aluminium doped zinc oxide thin films (ZnO:Al) were deposited by radio frequency (RF) magnetron sputtering. The RF power was varied from 60 to 350 W whereas the substrate temperature was kept at 160 °C. The structural, electrical and optical properties of the as‐deposited films were found to be influenced by the deposition power. The X‐ray diffraction analysis showed that all the films have a strong preferred orientation along the [001] direction. The crystallite size was varied from 14 to 36 nm, however no significant change was observed in the case of lattice constant. The optical band gap varied in the range 3.44–3.58 eV. The lowest resistivity of 1.2 × 10^−3^ Ω cm was shown by the films deposited at 250 W. The mobility of the films was found to increase with the deposition power.