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Influence of RF power and fluorine doping on the properties of sputtered ITO thin films

✍ Scribed by M. Nisha; M.K. Jayaraj

Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 325 KB
Volume: 255
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2008.06.019

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