Hafnium dioxide (HfO 2 ) thin films were deposited on a quartz substrate by RF reactive magnetron sputtering. The influence of O 2 /Ar flow ratio on the deposition rate, structure and optical properties of HfO 2 thin films were systematically studied using X-ray diffraction (XRD), scan electron micr
β¦ LIBER β¦
Influence of RF power on the structure and optical properties of sputtered hafnium dioxide thin films
β Scribed by Wenting Liu; Zhengtang Liu; Feng Yan; Tingting Tan
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 308 KB
- Volume
- 405
- Category
- Article
- ISSN
- 0921-4526
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