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Influence of Oxygen Content on the Physical and Electrical Properties of Thin Yttrium Oxide Dielectrics Deposited by Reactive RF Sputtering on Si Substrates

โœ Scribed by Tung-Ming Pan; Jian-Der Lee


Book ID
107454988
Publisher
Springer US
Year
2007
Tongue
English
Weight
727 KB
Volume
36
Category
Article
ISSN
0361-5235

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