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Influence of annealing temperature on properties of room-temperature rf-sputtered CuAlOx:Ca thin films

✍ Scribed by Huang, Bo-Wei; Chen, Jian-Zhang; Cheng, I-Chun


Book ID
122372376
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
513 KB
Volume
550
Category
Article
ISSN
0040-6090

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TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 Β°C. The str