✦ LIBER ✦

Inductively coupled plasma for polymer etching of 200 mm wafers

✍ Scribed by Forgotson, N.

Book ID: 121816771
Publisher: AVS (American Vacuum Society)
Year: 1996
Tongue: English
Weight: 317 KB
Volume: 14
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.588706

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Two-dimensional hybrid model of inductiv

Two-dimensional hybrid model of inductively coupled plasma sources for etching

✍ Ventzek, Peter L. G.; Sommerer, Timothy J.; Hoekstra, Robert J.; Kushner, Mark J 📂 Article 📅 1993 🏛 American Institute of Physics 🌐 English ⚖ 611 KB

Cryogenic inductively coupled plasma etc

Cryogenic inductively coupled plasma etching for fabrication of tapered through-silicon vias

✍ Kamto, A.; Divan, R.; Sumant, A. V.; Burkett, S. L. 📂 Article 📅 2010 🏛 AVS (American Vacuum Society) 🌐 English ⚖ 776 KB

Studies of the low-pressure inductively-

Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe

✍ Collison, Wenli Z. 📂 Article 📅 1998 🏛 AVS (American Vacuum Society) 🌐 English ⚖ 453 KB

Self-consistent simulation study on magn

Self-consistent simulation study on magnetized inductively coupled plasma for 450 mm semiconductor wafer processing

✍ Ho-Jun Lee; Yun-Gi Kim 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 746 KB

Evaluation of halogenated polyimide etch

Evaluation of halogenated polyimide etching for optical waveguide fabrication by using inductively coupled plasma

✍ Kwansoo Han; Junghee Kim; Woo-Hyuk Jang 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 228 KB 👁 1 views

Study of dry etching for GaN and InGaN-b

Study of dry etching for GaN and InGaN-based laser structure using inductively coupled plasma reactive ion etching

✍ Chih-Chiang Kao; H.W Huang; J.Y Tsai; C.C Yu; C.F Lin; H.C Kuo; S.C Wang 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 344 KB