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Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe

✍ Scribed by Collison, Wenli Z.


Book ID
127050570
Publisher
AVS (American Vacuum Society)
Year
1998
Tongue
English
Weight
453 KB
Volume
16
Category
Article
ISSN
0734-2101

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