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Inductive plasma sources for plasma implantation and deposition

✍ Scribed by Tuszewski, M.; Henins, I.; Nastasi, M.; Scarborough, W.K.; Walter, K.C.; Lee, D.H.

Book ID
114558637
Publisher
IEEE
Year
1998
Tongue
English
Weight
212 KB
Volume
26
Category
Article
ISSN
0093-3813

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High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the spu