In situ thin films of YBa2Cu3O7 prepared by single target DC-magnetron sputtering

✍ Scribed by J.-M. Triscone; M.G. Karkut; O. Brunner; L. Antognazza; M. Decroux; Ø. Fischer

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 347 KB
• Volume: 158
• Category: Article
• ISSN: 0921-4534
• DOI: 10.1016/0921-4534(89)90333-x

✦ Synopsis

We have prepared in situ thin films of YBa2fu307 by single target dc reactive magnetron sputtering. By a delicate adjustment of the oxygen partial pressure as well as the total sputtering pressure, we can grow stoichiometric films using a stoichiometric target. This method gives highly reproducible results and the films have optimum superconducting properties without the need for any post-annealing treatment. The films are highly textured with the c-axis perpendicular to the plane of the substrate for films grown on unoriented ZrO2 and a mixed c-axis and a-axis orientation on (100) SrTiO3. Zero resistances are obtained between 85 and 88 K with onsets between 90 and 91 K. The residual resistivity ratios R(RT)/R( 100 K) have values between 2.5 and 3 and the resistivity at 100 K is 60 ~t~ cm for films on SrTiO3. SEM photos reveal much smoother surfaces than post-annealed films. We also obtained RHEED streaks, indicative of an oriented atomically smooth surface, on a 250-300 A thick layer on SrTio3.