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In-situ YBa2Cu3O7−x thin films epitaxially grown by single target DC sputtering

✍ Scribed by M. Guilloux-Viry; M.G. Karkut; A. Perrin; O. Peña; J. Padiou; M. Sergent

Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
445 KB
Volume
166
Category
Article
ISSN
0921-4534

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In situ thin films of YBa2Cu3O7 prepared
In situ thin films of YBa2Cu3O7 prepared by single target DC-magnetron sputtering
✍ J.-M. Triscone; M.G. Karkut; O. Brunner; L. Antognazza; M. Decroux; Ø. Fischer 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 347 KB

We have prepared in situ thin films of YBa2fu307 by single target dc reactive magnetron sputtering. By a delicate adjustment of the oxygen partial pressure as well as the total sputtering pressure, we can grow stoichiometric films using a stoichiometric target. This method gives highly reproducible