In situ thin films of YBa2Cu3O7 prepared
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J.-M. Triscone; M.G. Karkut; O. Brunner; L. Antognazza; M. Decroux; Ø. Fischer
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Article
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1989
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Elsevier Science
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English
⚖ 347 KB
We have prepared in situ thin films of YBa2fu307 by single target dc reactive magnetron sputtering. By a delicate adjustment of the oxygen partial pressure as well as the total sputtering pressure, we can grow stoichiometric films using a stoichiometric target. This method gives highly reproducible