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DC-magnetron sputtering of YBa2Cu3O7−δ thin films for microwave applications

✍ Scribed by W. Rauch; H. Behner; G. Gieres; G. Sölkner; F. Fox; A.A. Valenzuela; E. Gornik


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
672 KB
Volume
198
Category
Article
ISSN
0921-4534

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In situ thin films of YBa2Cu3O7 prepared
✍ J.-M. Triscone; M.G. Karkut; O. Brunner; L. Antognazza; M. Decroux; Ø. Fischer 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 347 KB

We have prepared in situ thin films of YBa2fu307 by single target dc reactive magnetron sputtering. By a delicate adjustment of the oxygen partial pressure as well as the total sputtering pressure, we can grow stoichiometric films using a stoichiometric target. This method gives highly reproducible