## Abstract The strain distribution and defects in a graded AlN/GaN heterostructure comprising AlN layers from 3 nm up to 100 nm grown by plasmaβassisted MBE were studied using transmission electron microscopy techniques. Gradual strain relaxation was observed as well as strain partitioning between
In situ strain relaxation comparison between GaAsBi and GaInAs grown by molecular-beam epitaxy
β Scribed by France, R.; Jiang, C.-S.; Ptak, A. J.
- Book ID
- 120255837
- Publisher
- American Institute of Physics
- Year
- 2011
- Tongue
- English
- Weight
- 540 KB
- Volume
- 98
- Category
- Article
- ISSN
- 0003-6951
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
## Abstract The inβplane lattice parameters of InN, GaN and Al~2~O~3~ in a InN/GaN/Al~2~O~3~(0001) heterostructure have been measured as a function of temperature in the range of 25β350 Β°C, using high resolution Xβray diffraction. The results reveal that both the GaN and InN crystals follow the inβ
We have performed spectroscopic measurements in order to investigate the exciton localization mechanism and the bandgap energies of GaAsN in three regimes: (i) doped; (ii) intermediate doped-alloy; and (iii) alloy and the transition energies in strained GaInAsN/GaAs quantum wells laser structures.