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In situ RHEED, AFM, and REM investigations of the surface recovery of MBE-grown GaAs(0 0 1)-layers during growth interruptions

✍ Scribed by T. Franke; P. Kreutzer; Th. Zacher; W. Naumann; R. Anton


Book ID
108342793
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
744 KB
Volume
193
Category
Article
ISSN
0022-0248

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In situ investigation by GISAXS and GIXD
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The growth mode, strain state and shape of Ge islands were analyzed in situ, during their growth on Si(0 0 1), by combining grazing incidence small angle X-ray scattering (GISAXS) and X-ray diffraction (GIXD) measurements. GISAXS measurements provide the detailed evolution of the shape of the grown