✦ LIBER ✦
Degradation kinetics of ultrathin HfO2 layers on Si(1 0 0) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM
✍ Scribed by A. Zenkevich; Yu. Lebedinskii; G. Scarel; M. Fanciulli; A. Baturin; N. Lubovin
- Book ID
- 108210701
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 985 KB
- Volume
- 47
- Category
- Article
- ISSN
- 0026-2714
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