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In-situ monitoring of surface stoichiometry and growth kinetics study of GaN (0001) in MOVPE by spectroscopic ellipsometry

✍ Scribed by Yoshitaka Taniyasu; Akihiko Yoshikawa


Book ID
107452694
Publisher
Springer US
Year
2001
Tongue
English
Weight
193 KB
Volume
30
Category
Article
ISSN
0361-5235

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In Situ Monitoring of GaN Growth in Mult
✍ LΓΌnenbΓΌrger, M. ;Protzmann, H. ;Heuken, M. ;JΓΌrgensen, H. πŸ“‚ Article πŸ“… 1999 πŸ› John Wiley and Sons 🌐 English βš– 191 KB πŸ‘ 2 views

Normal incidence reflectivity measurements were carried out in an AIX 2000G3HT Multiwafer Planetary Reactor 1 MOVPE system, a large scale production tool for GaN-based devices. In situ monitoring was used to investigate nucleation behaviour, temperature dependence of GaN growth, and the deposition o