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In situ film thickness and temperature control of molecular beam epitaxy growth by pyrometric interferometry

✍ Scribed by F.G. Boebel; H. Möller; B. Hertel; H. Grothe; G. Schraud; St. Schröder; P. Chow

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 690 KB
Volume: 150
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(95)80180-k

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