๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

In-process control of Co silicide formation by RTA

โœ Scribed by J-M. Dilhac; C. Ganibal; N. Nolhier; P.B. Moynagh; C.P. Chew; P.J. Rosser


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
229 KB
Volume
19
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


In situ study of the formation of silici
โœ C. Van Bockstael; K. De Keyser; J. Demeulemeester; A. Vantomme; R.L. Van Meirhae ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 425 KB

We investigate Co silicide phase formation when extra Si is added within an as deposited 50 nm Co film. The addition of Si is investigated for both the Co/SiO 2 and Co/Si(1 0 0) system. A series of 10 Co-Si mixed films with a Si content varying from 21 to 59 at.% was prepared and investigated during