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Impurity incorporation during rf sputtering of silicon oxide layers

✍ Scribed by Petersson, S. ;Linker, G. ;Meyer, O.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Formation of the altered layer in silico

✍ A. Galdikas; A. Grigonis; L. Pranevičius; J. Vosylius 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 373 KB

Carbon Incorporation during the Dielectr

✍ Najmi, O.; Montero, I.; Galán, L.; Albella, J. M. 📂 Article 📅 1997 🏛 John Wiley and Sons 🌐 English ⚖ 320 KB 👁 2 views

On problems of reaction kinetics during

✍ Brodkorb, W. ;Salm, J. ;Steinbeiss, Ch. ;Steinbeiss, E. 📂 Article 📅 1980 🏛 John Wiley and Sons 🌐 English ⚖ 192 KB

Reoxidation of silicon substrates during

✍ H. Behner 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 340 KB

Electrical behavior of low-power RF magn

✍ Bi-Shiou Chiou; Shu-Ta Hsieh; Wen-Fa Wu 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 472 KB

Activation of the implanted impurity and

✍ Ya. VALAKH, M. ;Lysenko, V. S. ;Nazarov, A. N. ;Yu. RUDKO, G. ;Shakhraychuk, N. 📂 Article 📅 1992 🏛 John Wiley and Sons 🌐 English ⚖ 422 KB