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Improvement of hot-carrier-reliability by deuterium termination of Si/SiO2 interface defects

✍ Scribed by H. Takahashi; H. Yamada-Kaneta


Book ID
108418090
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
92 KB
Volume
216
Category
Article
ISSN
0169-4332

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We explore the hydrogen-related microstructures involved in hot electron defect creation at the Si(100)-SiO 2 interface of metal-oxide-semiconductor field effect transistors. With ab initio density functional calculations, the energetics and defect levels have been calculated for hydrogen in bulk si