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Improved underlayers for acid amplified resists

✍ Scribed by H.S. Sachdev; R.W. Kwong; A. Katnani; K.T. Kwietniak; M.G. Rosenfield; P.J. Coane

Book ID
103599323
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
350 KB
Volume
23
Category
Article
ISSN
0167-9317

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In order to clarify the photogenerated acid diffusion in resist film, the diffusion behavior of acid, as well as the role of additional base component was investigated in tert-butoxycarbonyl (t-BOC) protected type chemically amplified positive deep ultraviolet (DUV) resists. The resists consisted of