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Implantation damage and anomalous diffusion of implanted boron in silicon

✍ Scribed by Guo, Qiang; Bao, Ximao; Hong, Jianming; Yan, Yong; Feng, Duan


Book ID
120523837
Publisher
American Institute of Physics
Year
1989
Tongue
English
Weight
545 KB
Volume
54
Category
Article
ISSN
0003-6951

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