๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Impact of technology scaling on the 1/f noise of thin and thick gate oxide deep submicron NMOS transistors

โœ Scribed by Chew, K.W.; Yeo, K.S.; Chu, S.-F.


Book ID
114448015
Publisher
The Institution of Electrical Engineers
Year
2004
Tongue
English
Weight
396 KB
Volume
151
Category
Article
ISSN
1350-2409

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES