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Impact of programming mechanisms on the performance and reliability of nonvolatile memory devices based on Si nanocrystals

✍ Scribed by Ng, C.Y.; Chen, T.P.; Yang, M.; Yang, J.B.; Ding, L.; Li, C.M.; Du, A.; Trigg, A.


Book ID
114618162
Publisher
IEEE
Year
2006
Tongue
English
Weight
252 KB
Volume
53
Category
Article
ISSN
0018-9383

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A study of the influence of tunnel oxide
✍ Ng, C. Y. ;Chen, T. P. ;Du, A. πŸ“‚ Article πŸ“… 2006 πŸ› John Wiley and Sons 🌐 English βš– 241 KB

## Abstract In this work, we have fabricated silicon nanocrystal (nc‐Si) based Flash memories with two different tunnel‐oxide thicknesses (3 and 7 nm). The nc‐Si is synthesized with very‐low energy ion implantation and subsequent thermal annealing. The endurance and retention characteristics of the