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Impact of post-nitridation annealing on ultra-thin gate oxide performance

✍ Scribed by Yandong He; Ganggang Zhang

Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 341 KB
Volume: 256
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2009.08.072

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