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Impact of AlN nucleation layer on strain in GaN grown on 4H-SiC substrates

✍ Scribed by Cho, E.; Mogilatenko, A.; Brunner, F.; Richter, E.; Weyers, M.


Book ID
120199009
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
861 KB
Volume
371
Category
Article
ISSN
0022-0248

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Hydrogen-etching of 6H-SiC(0001) substrates removed mechanical polishing damage and produced an array of parallel, unit cell high steps. The initial stage of AlN deposition on these etched substrates occurred via island nucleation, both on step edges and on terraces. Coalesced AlN films did not show