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[IEEE International Electron Devices Meeting. Technical Digest. IEDM - San Francisco, CA, USA (10-13 Dec. 2000)] International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) - SALVO process for sub-50 nm low-V/sub T/ replacement gate CMOS with KrF lithography

✍ Scribed by Chang, C.-P.; Vuang, H.-H.; Baker, M.R.; Pai, C.S.; Klemens, F.P.; Miner, J.F.; Mansfield, W.M.; Kleiman, R.N.; Kornbllit, A.; Baumann, F.H.; Rogers, S.N.; Bude, M.; Grazul, J.L.; Lloyd, E.J.; Frei, M.; Sorsch, T.W.; Cirelli, R.; Ferry, E.; Bolan, K.; Barr, D.; Lee, J.T.-C.

Book ID: 120582464
Publisher: IEEE
Year: 2000
Weight: 407 KB
Edition: 2000
Category: Article
ISBN-13: 9780780364387
DOI: 10.1109/IEDM.2000.904257

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