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[IEEE IEEE International Electron Devices Meeting - San Francisco, CA, USA (8-11 Dec. 2002)] Digest. International Electron Devices Meeting, - Mass production worthy HfO/sub 2/-Al/sub 2/O/sub 3/ laminate capacitor technology using Hf liquid precursor for sub-100 nm DRAMs

✍ Scribed by Jung-Hyoung Lee, ; Jong Pyo Kim, ; Jong-Ho Lee, ; Yun-Seok Kim, ; Hyung-Seok Jung, ; Nae-In Lee, ; Ho-Kyu Kang, ; Kwang-Pyuk Suh, ; Mun-Mo Jeong, ; Kyu-Taek Hyun, ; Hion-Suck Baik, ; Young Su Chung, ; Xinye Liu, ; Ramanathan, S.; Seidel, T.; Winkler, J.; Londergan, A.; Hae young Kim, ; Jung Min Ha, ; Nam Kyu Lee,

Book ID: 120059531
Publisher: IEEE
Year: 2002
Weight: 239 KB
Category: Article
ISBN-13: 9780780374621
DOI: 10.1109/IEDM.2002.1175817

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