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[IEEE 2012 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2012.12.10-2012.12.13)] 2012 International Electron Devices Meeting - A Monte Carlo simulation of electron transport in Cu nano-interconnects: Suppression of resistance degradation due to LER/LWR

✍ Scribed by Kurusu, Takashi; Tanimoto, Hiroyoshi; Wada, Makoto; Isobayashi, Atsunobu; Kajita, Akihiro; Aoki, Nobutoshi; Toyoshima, Yoshiaki

Book ID: 120200918
Publisher: IEEE
Year: 2012
Weight: 524 KB
Category: Article
ISBN: 1467348708
DOI: 10.1109/IEDM.2012.6479140

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