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[IEEE 2009 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2009.04.27-2009.04.29)] 2009 International Symposium on VLSI Technology, Systems, and Applications - Properties of very thin adenine layer with high inhibition for 32nm node Cu/Low-K interconnection

✍ Scribed by Hara, M.; Aoki, H.; Masuzumi, T.; Watanabe, D.; Kimura, C.; Sugino, T.

Book ID: 126724872
Publisher: IEEE
Year: 2009
Weight: 202 KB
Category: Article
ISBN: 1424427843
DOI: 10.1109/VTSA.2009.5159269

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