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[IEEE 2009 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2009.04.27-2009.04.29)] 2009 International Symposium on VLSI Technology, Systems, and Applications - The device architecture dilemma for CMOS technologies: Opportunities & challenges of finFET over planar MOSFET

✍ Scribed by Parvais, B.; Mercha, A.; Collaert, N.; Rooyackers, R.; Ferain, I.; Jurczak, M.; Subramanian, V.; De Keersgieter, A.; Chiarella, T.; Kerner, C.; Witters, L.; Biesemans, S.; Hoffman, T.

Book ID: 121399348
Publisher: IEEE
Year: 2009
Weight: 325 KB
Category: Article
ISBN: 1424427843
DOI: 10.1109/VTSA.2009.5159300

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