𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE 2009 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2009.04.27-2009.04.29)] 2009 International Symposium on VLSI Technology, Systems, and Applications - Optimizing tunnel FET performance - Impact of device structure, transistor dimensions and choice of material

✍ Scribed by Knoch, Joachim

Book ID: 124148818
Publisher: IEEE
Year: 2009
Weight: 324 KB
Category: Article
ISBN: 1424427843
DOI: 10.1109/VTSA.2009.5159285

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE 2009 International Symposium on VL

[IEEE 2009 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2009.04.27-2009.04.29)] 2009 International Symposium on VLSI Technology, Systems, and Applications - FinFET resistance mitigation through design and process optimization

✍ Wang, Cindy; Chang, Josephine; Lin, Chung-Hsun; Kumar, Arvind; Gehring, Andreas; 📂 Article 📅 2009 🏛 IEEE ⚖ 372 KB

[IEEE 2009 International Symposium on VL

[IEEE 2009 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2009.04.27-2009.04.29)] 2009 International Symposium on VLSI Technology, Systems, and Applications - Multiple electron beam maskless lithography for high-volume manufacturing

✍ Chen, Jack J.H.; Lin, S.J.; Fang, T.Y.; Chang, S.M.; Krecinic, Faruk; Lin, Burn 📂 Article 📅 2009 🏛 IEEE ⚖ 710 KB

[IEEE 2009 International Symposium on VL

[IEEE 2009 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2009.04.27-2009.04.29)] 2009 International Symposium on VLSI Technology, Systems, and Applications - The device architecture dilemma for CMOS technologies: Opportunities & challenges of finFET over planar MOSFET

✍ Parvais, B.; Mercha, A.; Collaert, N.; Rooyackers, R.; Ferain, I.; Jurczak, M.; 📂 Article 📅 2009 🏛 IEEE ⚖ 325 KB

[IEEE 2009 International Symposium on VL

[IEEE 2009 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2009.04.27-2009.04.29)] 2009 International Symposium on VLSI Technology, Systems, and Applications - A new robust non-local algorithm for band-to-band tunneling simulation and its application to Tunnel-FET

✍ Shen, C.; Yang, L. T.; Toh, E.-H.; Heng, C.-H.; Samudra, G. S.; Yeo, Y.-C. 📂 Article 📅 2009 🏛 IEEE ⚖ 989 KB

[IEEE 2009 International Symposium on VL

[IEEE 2009 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2009.04.27-2009.04.29)] 2009 International Symposium on VLSI Technology, Systems, and Applications - Boron carbon nitride film containing hydrogen for 2nm node low-k interconnection

✍ Aoki, Hidemitsu; Takuroh Masuzumi, ; Makoto Hara, ; Watanabe, Daisuke; Kimura, C 📂 Article 📅 2009 🏛 IEEE ⚖ 256 KB

[IEEE 2011 International Symposium on VL

[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - Graphene transistors 2011

✍ Schwierz, Frank 📂 Article 📅 2011 🏛 IEEE ⚖ 235 KB