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[IEEE 2009 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) - Hsinchu, Taiwan (2009.04.27-2009.04.29)] 2009 International Symposium on VLSI Technology, Systems, and Applications - An investigation about the limitation of strained-Si technology

✍ Scribed by Liao, M. H.; Lingyen Yeh, ; Lu, J. C.; Yu, M. H.; Wang, L. T.; Wu, J.; Jeng, P.-R.; Lee, T.-L.; Jang, Simon

Book ID: 126658001
Publisher: IEEE
Year: 2009
Weight: 358 KB
Category: Article
ISBN: 1424427843
DOI: 10.1109/VTSA.2009.5159277

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