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[IEEE 2008 International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2008.06.1-2008.06.4)] 2008 International Interconnect Technology Conference - Development and optimization of porous pSiCOH interconnect dielectrics for 45 nm and beyond

✍ Scribed by Grill, A.; Gates, S.; Dimitrakopoulos, C.; Patel, V.; Cohen, S.; Ostrovski, Y.; Liniger, E.; Simonyi, E.; Restaino, D.; Sankaran, S.; Reiter, S.; Demos, A.; Yim, K. S.; Nguyen, V.; Rocha, J.; Ho, D.

Book ID: 126748206
Publisher: IEEE
Year: 2008
Weight: 150 KB
Category: Article
ISBN: 1424419115
DOI: 10.1109/IITC.2008.4546915

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