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[IEEE 2007 IEEE Symposium on VLSI Technology - Kyoto, Japan (2007.06.12-2007.06.14)] 2007 IEEE Symposium on VLSI Technology - Dependable Integration of Full-Porous Low-k Interconnect and Low-leakage/ Low-cost Transistor for 45nm LSTP Platform

✍ Scribed by Sukegawa, K.; Yamamoto, T.; Kudo, H.; Kubo, T.; Sukegawa, T.; Ehara, H.; Ochmizu, H.; Fukuda, M.; Mizushima, Y.; Shimoda, Y.; Tajima, M.; Oryoji, M.; Nakata, Y.; Watatani, H.; Sakai, H.; Asneil, A.; Sakai, S.; Matsuyama, H.; Kurata, H.; Tsukune, A.; Shimizu, N.; Futatsugi, T.; Satoh, S.; Kase, M.; Sugii, T.

Book ID: 126646565
Publisher: IEEE
Year: 2007
Tongue: Japanese
Weight: 585 KB
Category: Article
ISBN: 4900784036
DOI: 10.1109/VLSIT.2007.4339681

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