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[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Honolulu, HI, USA (June 13-15, 2006)] 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - A Comparative Study of NBTI and PBTI (Charge Trapping) in SiO2/HfO2 Stacks with FUSI, TiN, Re Gates

✍ Scribed by Zafar, S.; Kim, Y.; Narayanan, V.; Cabral, C.; Paruchuri, V.; Doris, B.; Stathis, J.; Callegari, A.; Chudzik, M.

Book ID: 120172587
Publisher: IEEE
Year: 2006
Weight: 149 KB
Category: Article
ISBN-13: 9781424400058
DOI: 10.1109/VLSIT.2006.1705198

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