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[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Honolulu, HI, USA (June 13-15, 2006)] 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Tri-Gate Transistor Architecture with High-k Gate Dielectrics, Metal Gates and Strain Engineering

✍ Scribed by Kavalieros, J.; Doyle, B.; Datta, S.; Dewey, G.; Doczy, M.; Jin, B.; Lionberger, D.; Metz, M.; Rachmady, W.; Radosavljevic, M.; Shah, U.; Zelick, N.; Chau, R.

Book ID: 118130287
Publisher: IEEE
Year: 2006
Weight: 915 KB
Volume: 0
Category: Article
ISBN-13: 9781424400058
DOI: 10.1109/vlsit.2006.1705211

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