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[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Honolulu, HI, USA (June 13-15, 2006)] 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Very Low Voltage SiO2/HfON/HfAlO/TaN Memory with Fast Speed and Good Retention

✍ Scribed by Lai, C.; Chin, A.; Kao, H.; Chen, K.; Hong, M.; Kwo, J.; Chi, C.

Book ID: 126670866
Publisher: IEEE
Year: 2006
Weight: 310 KB
Category: Article
ISBN-13: 9781424400058
DOI: 10.1109/VLSIT.2006.1705208

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