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[IEEE 2004 IEEE International Reliability Physics Symposium. - Phoenix, AZ, USA (25-29 April 2004)] 2004 IEEE International Reliability Physics Symposium. Proceedings - Highly reliable dielectric/metal bilayer sidewall diffusion barrier in Cu/porous organic ultra low-k interconnects

✍ Scribed by Zhe Chen, ; Prasad, K.; Li, C.Y.; Lu, P.W.; Su, S.S.; Tang, L.J.

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