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[IEEE 2003 8th International Symposium on Plasma- and Process-Induced Damage - Corbeil-Essonnes, France (24-25 April 2003)] 2003 8th International Symposium Plasma- and Process-Induced Damage. - Critical issues in plasma etching processes involved in the gate etch fabrication of CMOS devices

✍ Scribed by Joubert, O.; Pargon, E.; Detter, X.; Chevolleau, J.; Cunge, G.; Vallier, L.

Book ID: 126676093
Publisher: IEEE
Year: 2003
Weight: 586 KB
Category: Article
ISBN-13: 9780780377479
DOI: 10.1109/PPID.2003.1199719

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