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[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Two abnormal peaks induced by plasma process in the noise spectra of etched Si and Si/sub 1-x/Ge/sub x/

✍ Scribed by Ouacha, H.; Mamor, M.; Willander, M.; Ouacha, A.; Auret, F.D.; Goodman, S.A.

Book ID: 126734451
Publisher: American Vacuum Soc
Year: 2000
Weight: 235 KB
Category: Article
ISBN-13: 9780965157742
DOI: 10.1109/PPID.2000.870623

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