𝔖 Bobbio Scriptorium

✦ LIBER ✦

[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Influence of plasma induced damage during active etch on silicon defect generation

✍ Scribed by Nallapati, G.; Loiko, K.V.

Book ID: 126670036
Publisher: American Vacuum Soc
Year: 2000
Weight: 711 KB
Category: Article
ISBN-13: 9780965157742
DOI: 10.1109/PPID.2000.870596

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[American Vacuum Soc 2000 5th Internatio

[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Radiation induced depassivation of latent plasma damage

✍ Pantisano, L.; Paccagnella, A.; Valentini, M.G.; Flament, O.; Musseau, O.; Fuoch 📂 Article 📅 2000 🏛 American Vacuum Soc ⚖ 322 KB

[American Vacuum Soc 2000 5th Internatio

[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Anomalously weak antenna ratio dependence of plasma process-induced damage

✍ Van den Bosch, G.; Creusen, M.; Degraeve, R.; Kaczer, B.; Groeseneken, G. 📂 Article 📅 2000 🏛 American Vacuum Soc ⚖ 323 KB

[American Vacuum Soc 2000 5th Internatio

[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Study of chamber history effect in oxide etcher

✍ Liao, C.H.; Pang, S.L.; Chang, B.J.; Lu, K.L. 📂 Article 📅 2000 🏛 American Vacuum Soc ⚖ 301 KB

[American Vacuum Soc 2000 5th Internatio

[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Interface state creation due to low-field latent damage depassivation

✍ Pantisano, L.; Paccagnella, A.; Cellere, G.; Colombo, P.; Valentini, M.G. 📂 Article 📅 2000 🏛 American Vacuum Soc ⚖ 338 KB

[American Vacuum Soc 2000 5th Internatio

[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Plasma process induced damage in sputtered TiN metal gate capacitors with ultra-thin nitrided oxide

✍ Chen, C.-C.; Lin, H.-C.; Chang, C.-Y.; Chao, T.-S.; Huang, S.-C.; Wu, W.-F.; Hua 📂 Article 📅 2000 🏛 American Vacuum Soc ⚖ 404 KB

[American Vacuum Soc 2000 5th Internatio

[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Topographical dependence of charging and new phenomenon during inductively coupled plasma (ICP) CVD process

✍ Carrere, J.; Oberlin, J.-C.; Haond, M. 📂 Article 📅 2000 🏛 American Vacuum Soc ⚖ 396 KB