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[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Topographical dependence of charging and new phenomenon during inductively coupled plasma (ICP) CVD process

✍ Scribed by Carrere, J.; Oberlin, J.-C.; Haond, M.

Book ID: 120251744
Publisher: American Vacuum Soc
Year: 2000
Weight: 396 KB
Category: Article
ISBN-13: 9780965157742
DOI: 10.1109/PPID.2000.870659

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