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[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Interface state creation due to low-field latent damage depassivation

✍ Scribed by Pantisano, L.; Paccagnella, A.; Cellere, G.; Colombo, P.; Valentini, M.G.

Book ID: 126663041
Publisher: American Vacuum Soc
Year: 2000
Weight: 338 KB
Category: Article
ISBN-13: 9780965157742
DOI: 10.1109/PPID.2000.870604

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