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[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Plasma process induced damage in sputtered TiN metal gate capacitors with ultra-thin nitrided oxide

✍ Scribed by Chen, C.-C.; Lin, H.-C.; Chang, C.-Y.; Chao, T.-S.; Huang, S.-C.; Wu, W.-F.; Huang, T.-Y.; Liang, M.-S.

Book ID: 126654600
Publisher: American Vacuum Soc
Year: 2000
Weight: 404 KB
Category: Article
ISBN-13: 9780965157742
DOI: 10.1109/PPID.2000.870633

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