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[IEEE 2003 8th International Symposium on Plasma- and Process-Induced Damage - Corbeil-Essonnes, France (24-25 April 2003)] 2003 8th International Symposium Plasma- and Process-Induced Damage. - Initial gate leakage in ultra thin SiO/sub 2/ - the role of a brief stress

✍ Scribed by Cheung, K.P.

Book ID: 126738504
Publisher: IEEE
Year: 2003
Weight: 460 KB
Category: Article
ISBN-13: 9780780377479
DOI: 10.1109/PPID.2003.1200938

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