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ICP etching of polycrystalline diamonds: Fabrication of diamond nano-tips for AFM cantilevers

✍ Scribed by Uetsuka, H.; Yamada, T.; Shikata, S.


Book ID
121400976
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
747 KB
Volume
17
Category
Article
ISSN
0925-9635

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## Abstract The present work reports on application of gold, nickel, and diamond nano‐particles as a masking material for realization of diamond 3D nano‐structures after a low power (100 W) plasma etching process in a gas mixture of CF~4~/O~2~. Obtained 3D structures strongly depend on the masking