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Hydrogen plasma pretreatment effect on the deposition of aluminum thin films from metalorganic chemical vapor deposition using dimethylethylamine alane

✍ Scribed by Jang, Tae Woong; Rhee, Hwa Sung; Ahn, Byung Tae


Book ID
125497916
Publisher
AVS (American Vacuum Society)
Year
1999
Tongue
English
Weight
972 KB
Volume
17
Category
Article
ISSN
0734-2101

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