Hydrogen plasma etching of pyromeric carbon films

✍ Scribed by S. Park; R.M. Walser

• Book ID: 102993959
• Publisher: Elsevier Science
• Year: 1985
• Tongue: English
• Weight: 595 KB
• Volume: 23
• Category: Article
• ISSN: 0008-6223
• DOI: 10.1016/0008-6223(85)90231-3

✦ Synopsis

We report on a study of the etching behavior of amorphous carbon films prepared by the thermal conversion of polyfurfuryl alcohol in a hydrogen plasma. It was demonstrated that the etch rates were sensitive to the heat treatment temperature of the pyrolysis process. Etch rates increased with the gas pressure and the substrate temperature. Scanning electron microscopy revealed regions of anomalously enhanced etching and the formation of mosaic "riverlike" patterns. The enhanced etching is believed to be associated with the internal stress of carbon films.