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Etching and hydrogen diffusion mechanisms during a hydrogen plasma treatment of silicon thin films

✍ Scribed by A Fontcuberta i Morral; P Roca i Cabarrocas

Book ID
117145466
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
207 KB
Volume
299-302
Category
Article
ISSN
0022-3093

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